文献类型：期刊文献

中文题名：高性能193nm反射膜的制备与误差分析

英文题名：The Preparation and Error Analysis of High-property 193nm HR Mirrors

作者：尚淑珍[1];徐山清[1];邵建达[2]

机构：[1]华东理工大学机械与动力工程学院承压系统安全科学教育部重点实验室,上海200237;[2]中国科学院上海光学精密机械研究所光学薄膜技术与研究发展中心,上海201800

年份：2008

卷号：28

期号：3

起止页码：207

中文期刊名：应用激光

外文期刊名：Applied Laser

收录：CSTPCD;;北大核心:【北大核心2004】；CSCD:【CSCD2011_2012】；

基金：上海市重点学科建设项目资助(项目编号:B503)

语种：中文

中文关键词：193nm;反射膜;误差分析;吸收;散射

外文关键词：193nm; HR Coating; error Analysis; absorption; scattering

摘要：分析了膜厚控制误差对反射膜设计曲线的影响,发现高低折射率材料厚度反方向变化时(高折射率膜层厚度增加,低折射率膜层厚度减小),反射膜的反射率变化不明显,设计的膜系结构对这种膜厚变化方式的制造误差宽容。在此基础上制备了193nm反射膜,结果表明退火前光学损耗相对较大,实验结果与理论计算结果存在一定差距,并且散射损耗在总的光学损耗中所占比例很小,而吸收损耗占光学损耗的主要部分,起主导作用。退火后光学损耗明显下降,实验结果与理论计算结果更为接近,193nm反射膜的反射率达98%以上。散射损耗增加至接近吸收损耗的水平,不过在总的光学损耗中仍然占比较小的比例。说明当吸收损耗下降到一定程度时,散射损耗所起的作用也是不可忽视的。
The effects of errors of optical thickness on designing reflectance of 193nm HR mirrors were analyzed. It revealed that the reflectance of the HR mirrors changed slightly if the optical thickness of the highand low-refractive index layers changed differently （the optical thickness of the high-refractive index layers increased and the optical thickness of the low-refractive index layers decreased）. The designed film system could endure this kind of manufactured error perfectly. The 193nm HR mirrors were evaporated on the basis of the results of the error analysis. It could see that the optical loss was relatively high and it differed from the designing value. The scattering loss was much lower than the absorbance loss which occupied the main role of the total loss. The optical loss reduced considerably so that the reflectance of the HR mirror reached more than 98% which was near to the theoretical number. The scattering loss increased to the level which was a little lower than the absorbance loss so it could not be omitted.