文献类型：期刊文献

英文题名：Thermal and thermoxidative decomposition of a heat-resistant poly(dimethylsilylene ethynylenephenyleneethynylene) resin

作者：Liu, Xiaotian[1];Lv, Shuaikang[1];Heng, Kejie[1];Qiao, Zhiyao[1];Tang, Junkun[1];Yuan, Qiaolong[1];Huang, Farong[1]

机构：[1]East China Univ Sci & Technol, Sch Mat Sci & Engn, Key Lab Specially Funct Mat & Related Technol, Minist Educ, 130 Meilong Rd, Shanghai, Peoples R China

年份：2023

卷号：148

期号：17

起止页码：8889

外文期刊名：JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY

收录：;EI(收录号：20232714360472);WOS:【SCI-EXPANDED(收录号:WOS:001020517800002)】；

语种：英文

外文关键词：Silicon-containing arylacetylene resin; Thermal stability; Pyrolysis mechanism; TGA combined analysis

摘要：Poly(silylene arylacetylene) resins (PSA resins) show excellent thermal stability under inert atmosphere but weak thermoxidative stability under aerobic environment. The thermal and thermoxidative decomposition of the cured poly(dimethylsiliylene ethynylenephenyleneethynylene)(PSA-M) resin was comparatively investigated in this article. The pyrolysis-gas chromatography-mass spectrometry was used to analyze the decomposed products and determine the structure of the PSA-M resin. The thermogravimetric analysis coupled to fourier transform infrared spectroscopy and mass spectrometry (TGA-FTIR-MS) and normal fourier transform infrared spectroscopy (FTIR) is used to investigate the decomposition mechanism. In combined TGA-FTIR-MS technique, Fourier transform infrared spectroscopy and mass spectrometry were used to detect the volatile products from TGA instrument. Normal FTIR was used to determine the chemical structures of the TGA residues at different temperatures under oxygen-free and aerobic atmospheres. The results show the decomposition under the oxygen-free atmosphere (N-2) mainly undergoes the cleavage of the side groups on silicon atoms, the release of degraded fragments and the dehydrogenated carbonization. The oxidation decomposition mainly undergoes the oxidation of residual internal alkyne groups, the oxidation cleavage of the side groups on silicon atoms and the decomposition of the oxidized products. The decomposition mechanisms for the PSA-M resin under oxygen-free and aerobic atmospheres are separately suggested.