文献类型：会议论文

英文题名：Fabrication and structure characterization of molecular deposition films

作者：Wang, Qiangbin[1]; Gu, Hongchen[1]; Gao, Manglai[2]; Zhang, Siwei[2]

机构：[1]E China Univ Sci & Technol, Inst Tech Chem & Phys, Shanghai 200237, Peoples R China

会议论文集：4th International Conference on Thin Film Physics and Applications

会议日期：MAY 08-11, 2000

会议地点：SHANGHAI, PEOPLES R CHINA

语种：英文

外文关键词：molecular deposition film; structure characteristics; atomic force microscope; X-photoelectron spectroscopy; ab initial calculation

摘要：Molecular Deposition (MD) film is a new kind of nanometer ultrathin film, which is made by electrostatic attraction between opposite charges from cationic and anionic compounds. The fabrication and structure characterization of four different molecular deposition films, monolayer MD film, bilayer MD film, trilayer MD film and tetralayer MD film, were reported in this paper. According to the topography analysis of the clear Au substrate and monolayer MD film by atomic force microscope and to the element content results of the four different MD films by X - ray Photoelectron Spectroscopy, the depositing process of MD film is illustrated to be deposited by monolayer. The authors first put forward to calculate the charge distribution in the molecule of the MD film with ab initial calculation; and the results first theoretically explain why the depositing process of MD film is deposited by monolayer.