文献类型：期刊文献

英文题名：Selective adsorption and separation of salicylic acid and 4-hydroxyisophthalic acid from industry-grade 4-hydroxybenzoic acid on UiO-66

作者：Yuan, Kai[1];Sun, Ye[1];Peng, Yangfeng[1];Wei, Yongming[1];Wu, Yanyang[1];He, Quan[2]

机构：[1]East China Univ Sci & Technol, Sch Chem Engn, 130 Meilong Rd, Shanghai 200237, Peoples R China;[2]Dalhousie Univ, Fac Agr, Dept Engn, Truro, NS, Canada

年份：2024

卷号：19

期号：5

外文期刊名：ASIA-PACIFIC JOURNAL OF CHEMICAL ENGINEERING

收录：;EI(收录号：20242116136750);WOS:【SCI-EXPANDED(收录号:WOS:001228600100001)】；

基金：The authors are thankful for the financial support provided by the National Natural Science Foundation of China (21978082).

语种：英文

外文关键词：4-hydroxybenzoic acid; 4-hydroxyisophthalic acid; MOF; phenolic acid analogues separation; purification; salicylic acid; selective adsorption; UiO-66

摘要：In this study, UiO-66 was employed for the first time as an adsorbent to separate phenolic acid analogues, specifically 4-hydroxyisophthalic acid and salicylic acid, from impurities. Synthesized in-house, UiO-66 was shown to exhibit high selectivity towards 4-HIPA/4-HBA and SA/4-HBA when a molar equivalent of acetic acid modulator to terephthalic acid was set at 44. The adsorption capacities for 4-HBA, 4-HIPA, and SA were determined to be 56.34, 55.02, and 60.34 mg/g, respectively. Furthermore, it was observed that after six regeneration cycles, the adsorption capacity for 4-HBA remained nearly unchanged, whereas those for 4-HIPA and SA decreased by 5.6% and 2.6%, respectively. FTIR and XPS analyses revealed that all three compounds were adsorbed at the same dominant Zr cluster site on UiO-66, primarily through hydrogen bonding and electrostatic interaction. Dynamic adsorption experiments revealed that 4-HBA was the first to elute, maintaining the residual contents of 4-HIPA and SA below 0.1 wt%. Compared to traditional separation techniques, this paper provided a simple and effective method to purify industrial grade 4-hydroxybenzoic acid.