文献类型：期刊文献

英文题名：Photomanipulated Architecture and Patterning of Azopolymer Array

作者：Kong, Xueli[1];Wang, Xiaofan[1];Luo, Tianchan[2];Yao, Yuan[1];Li, Lei[2];Lin, Shaoliang[1]

机构：[1]East China Univ Sci & Technol, Shanghai Key Lab Adv Polymer Mat, Sch Mat Sci & Engn, Key Lab Ultrafine Mat,Minist Educ, Shanghai 200237, Peoples R China;[2]Xiamen Univ, Coll Mat, Xiamen 621005, Peoples R China

年份：2017

卷号：9

期号：22

起止页码：19345

外文期刊名：ACS APPLIED MATERIALS & INTERFACES

收录：;EI(收录号：20172403765022);WOS:【SCI-EXPANDED(收录号:WOS:000403136400104)】；

基金：This work was supported by National Natural Science Foundation of China (51622301, 51573046, and 51573088). Support from Projects of Shanghai Municipality (14SG29) and Fundamental Research Funds for the Central Universities (B14018 and WD1616010) is also appreciated.

语种：英文

外文关键词：surface patterning; azobenzene; photomanipulation; micro array; 3D architecture

摘要：Here reported is the approach to prepare the tunable 3D architecture and patterning through photoinduced orientation of azopolymer. The hemispherical PAzoMA array can be transformed into spindlelike, flat ellipsoidlike, thick spindlelike, near-hexagon, near-quadrangle, and near-rhombus arrays while being exposed to linearly polarized light (LPL). The size and alignment of the arrays can be precisely controlled by manipulating the irradiation time. Furthermore, complex 3D architectures of the PAzoMA array are readily fabricated through secondary irradiation along different direction. This technique is promising for functionalized surfaces and photonic devices.