文献类型：期刊文献

英文题名：Pulse current electrodeposition of Al from an AlCl₃-EMIC ionic liquid

作者：Li, Bing[1];Fan, Chunhua[1];Chen, Yan[1];Lou, Jingwei[1];Yan, Lingguang[1]

机构：[1]E China Univ Sci & Technol, Sch Resource & Environm Engn, Shanghai 200237, Peoples R China

年份：2011

卷号：56

期号：16

起止页码：5478

外文期刊名：ELECTROCHIMICA ACTA

收录：;WOS:【SCI-EXPANDED(收录号:WOS:000292428000006)】；

基金：This study was financed by the National Natural Science Foundation of China (Research Project 50474027).

语种：英文

外文关键词：Electrodeposition; Pulse current; Al coating; Ionic liquid; LaCl3

摘要：Electrodeposition of aluminum from an AlCl3-EMIC ionic liquid with or without the addition of saturated LaCl3 was carried out by both direct- and pulse-current plating methods. The effects of various parameters, including current density, pulse frequency, current on/off duration (t(on) and t(off)), and temperature, on deposit morphology and crystal size were investigated. Deposits prepared by pulse-current plating gave a brighter and flatter surface than those prepared by direct-current plating at appropriate pulse current parameters. Temperature and pulse-current frequency (t(off)) were shown to significantly affect deposit morphology. Coalescence of grains during toff periods in the pulse current plating was observed, especially at temperatures above 60 degrees C. Increasing the temperature from 25 to 90 degrees C caused an increase in deposit grain size and resulted in a change of grain shapes from a small sphere-like form to a feather-like form. As a result, the adhesion of the deposited aluminum to the substrate was lowered. Smaller grain sizes and well-adhered deposits were achieved at lower temperatures. For example, deposition at 25 degrees C resulted in the smallest crystal size of about 0.3 mu m under the conditions of t(on) = 80 ms, t(off) = 20 ms, and i = 8 mA/cm(2). Furthermore, the addition of LaCl3 to the melt at 60 degrees C effectively reduced the porosity and improved compactness of deposits. (C) 2011 Elsevier Ltd. All rights reserved.