文献类型：期刊文献

中文题名：H2O和O3对热原子层沉积Al2O3薄膜性能研究

英文题名：Influence of H2O and O3 on thermal atomic layer deposited Al2O3 film performance

作者：Li, Shizheng[1]; Xu, Jiahui[1]; Ye, Xiaojun[1]; Liu, Cui[1]; Yuan, Xiao[1]; Li, Hongbo[1]

机构：[1] School of Materials Science and Engineering, East China University of Science and Technology, Shanghai, 200237, China

年份：2021

卷号：42

期号：4

起止页码：223

外文期刊名：Taiyangneng Xuebao/Acta Energiae Solaris Sinica

收录：EI(收录号：20211910339550)

语种：中文

外文关键词：Alumina - Aluminum coatings - Atomic layer deposition - Passivation - Interface states - Annealing - Deposition rates - Refractive index

摘要：Al2O3 films were deposited by thermal atomic layer deposition with trimethylaluminum (TMA) as aluminum source and H2O, O3 and H2O+O3 as oxidants. The growth, elemental distributions, film structure and surface passivation quality of Al2O3 films are investigated as a function of the oxidant species and post-annealing process. It indicates that the H2O based Al2O3 films have a higher deposition rate and refractive index, together with the lower impurity elements concentration and interface defects density than the O3 based Al2O3 films. However, higher fixed charge density and improved thermal stability can be observed on the O3 based Al2O3 films. By adding H2O to the O3 process, the impurity elements concentration in Al2O3 films and the interface defects density can be effectively reduced, while the high negative fixed charge density of the O3 based Al2O3 films is still retained, which combines the advantages of both H2O and O3 based Al2O3 films in passivation performance. ? 2021, Solar Energy Periodical Office Co., Ltd. All right reserved.