文献类型：期刊文献

英文题名：Effects of thermal treatment on broadband near-infrared emission from Bi-doped chalcohalide glasses

作者：Yang Guang[1];Chen Danping[2];Wang Wei[1];Xu Yinsheng[1];Zeng Huidan[1];Yang Yunxia[1];Chen Guorong[1]

机构：[1]E China Univ Sci & Technol, Sch Mat Sci & Engn, Key Lab Ultrafine Mat, Minist Educ, Shanghai 200237, Peoples R China;[2]Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China

年份：2008

卷号：28

期号：16

起止页码：3189

外文期刊名：JOURNAL OF THE EUROPEAN CERAMIC SOCIETY

收录：;EI(收录号：20083811574236);WOS:【SCI-EXPANDED(收录号:WOS:000260276300023)】；

基金：This research is financially supported by the National Natural Science Foundation of China (NSFC 50702021).

语种：英文

外文关键词：X-ray method; Optical properties; Glass; Functional applications; Bismuth-doped

摘要：GeGaSKBr glass with Bi ions as emission centers were fabricated. An intense emission centered at around 1230 nm with the width of more than 175 nm was observed by 808 nm photo-excitation of the glass. Lower quenching rate and thermal treatment promote micro-crystallization process, thus strengthening the emission. Crown Copyright (c) 2008 Published by Elsevier Ltd. All rights reserved.