文献类型：期刊文献

英文题名：Trace level nitrite sensitized photolysis of the antimicrobial agents parachlormetaxylenol and chlorophene in water

作者：Li, Yueyue[1];Qin, Hao[1];Li, Yunong[1];Lu, Junhe[1];Zhou, Lei[2];Chovelon, Jean-Marc[3];Ji, Yuefei[1]

机构：[1]Nanjing Agr Univ, Coll Resources & Environm Sci, Nanjing 210095, Peoples R China;[2]East China Univ Sci & Technol, Sch Resources & Environm Engn, Shanghai 200237, Peoples R China;[3]Univ Bernard Lyon 1, Univ Lyon, CNRS, IRCELYON, F-69626 Villeurbanne, France

年份：2021

卷号：200

外文期刊名：WATER RESEARCH

收录：;EI(收录号：20212310454633);WOS:【SCI-EXPANDED(收录号:WOS:000664769100012)】；

基金：The authors gratefully acknowledge financial support from the National Natural Science Foundation of China (Grant No. 22076080 and 22076079). We thank the anonymous reviewers for their valuable comments and constructive suggestions.

语种：英文

外文关键词：Chloroxylenol; Chlorophene; Nitrite; Nitrogen dioxide radical; Photosensitization; Reactive nitrogen species

摘要：Nitrite (NO2-)-sensitized photolysis plays an important role in the attenuation of effluent-derived trace organic contaminants (e.g., anilines, phenolic compounds, etc.) in surface waters. However, the kinetics, mechanisms, and influencing factors of photolysis of many emerging contaminants sensitized by NO2- still remain largely unknown. Herein, we report that NO2--sensitized photolysis of the antimicrobial agents parachlormetaxylenol (PCMX) and chlorophene (CP) in aqueous solution under ultraviolet 365 nm (UV355) radiation. A nonlinear increase in photolysis rate constants of PCMX and CP was observed with increasing NO2- concentration. Radical quenching studies and kinetic modeling revealed that hydroxyl radical (HO center dot) and nitrogen dioxide radicals (NO2 center dot) contributed dominantly to the removal of PCMX and CP. Solid phase extraction (SPE) combined with high resolution-mass spectrometry (HR-MS) analysis identified a series of intermediate products including hydroxylated, nitrated, nitrosated, and dimerized derivatives. Experiments with isotopically labelled nitrite ((NO2)-N-15) showed that the nitro- and nitroso-substituents of intermediate products were derived from the nitrite nitrogen. Based on the identified products and theoretical computations, the mechanisms and pathways of NO2-sensitized photolysis of PCMX and CP are elucidated. Deoxygenation partially inhibited the formation of 4-chloro-3,5-dimethyl-2-nitrophenol (nitro-PCMX) while the presence of HO center dot scavenger such as isopropanol (i-PrOH) suppressed the further transformation of nitro-PCMX. The presence of Mississippi River natural organic matter (MRNOM) inhibited the removal of PCMX and CP, likely due to light screening and radical quenching. However, appreciable degradation of PCMX and CP was still observed in wastewater and wetland water matrices. Results of this study shed some light on the transformation and fate of PCMX and CP in NO2-rich wastewater effluents or effluent-impacted surface waters under solar radiation. (C) 2021 Elsevier Ltd. All rights reserved.