详细信息
聚苯乙烯共价修饰的二硫化钼钠米片宽带光限幅功能材料的合成与表征
Synthesis and Characterization of Polystyrene Covalently Modified MoS_2 Broadband Optical Limiting Functional Material
文献类型:期刊文献
中文题名:聚苯乙烯共价修饰的二硫化钼钠米片宽带光限幅功能材料的合成与表征
英文题名:Synthesis and Characterization of Polystyrene Covalently Modified MoS_2 Broadband Optical Limiting Functional Material
作者:贾会梅[1];宛延[2];程红霞[1];韩梦茹[1];张斌[1];陈彧[1]
机构:[1]华东理工大学化学与分子工程学院,教育部结构可控先进功能材料及其制备重点实验室,上海200237;[2]北京市第十三中学,北京100009
年份:2018
卷号:31
期号:1
起止页码:28
中文期刊名:功能高分子学报
外文期刊名:Journal of Functional Polymers
收录:CSTPCD;;北大核心:【北大核心2017】;CSCD:【CSCD2017_2018】;
基金:国家自然科学基金(61378072)
语种:中文
中文关键词:二硫化钼纳米片;共价修饰;聚苯乙烯;非线性光学;光限幅
外文关键词:MoS 2 nanosheets;covalent modification;polystyrene;nonlinear optics;optical limiting
摘要:利用原位聚合方法将聚苯乙烯(PS)共价接枝到二硫化钼纳米片表面,获得的材料MoS_2-PS能均匀地分散在常见的有机溶剂中。开孔Z-扫描实验结果表明:与MoS_2、MoS_2/PS相比,MoS_2-PS的N,N-二甲基甲酰胺(DMF)溶液及其聚甲基丙烯酸甲酯(PMMA)薄膜样品均表现出更好的非线性光学性能。相对于溶液,在532nm和1 064nm激光激发时,MoS_2-PS/PMMA固体薄膜表现出最大的非线性吸收系数(βeff),分别达到407.70cm/GW(MoS_2-PMMA:100.69cm/GW;MoS_2/PS/PMMA:116.55cm/GW)和429.64cm/GW(MoS_2-PMMA:-48.92cm/GW;MoS_2/PS/PMMA:66.31cm/GW);相应的光限幅阈值分别为0.92GW/cm2(532nm)和1.12GW/cm2(1 064nm)。MoS_2-PS/PMMA固体薄膜经200℃退火处理后,βeff和光限幅性能得到增强(βeff分别为455.67cm/GW和448.90cm/GW;光限幅阈值分别为1.07GW/cm2和0.87GW/cm2)。
New soluble MoS 2 nanosheets covalently functionalized with polystyrene(PS),MoS 2-PS,was in situ synthesized.The open-aperture Z-scan results demonstrated that both the solution of MoS 2-PS in DMF and the MoS 2-PS/PMMA film showed superior nonlinear optical(NLO)and optical limiting(OL)responses when compared to MoS 2 and MoS 2/PS blends.The thin films had a much higher concentration than the solutions at the same level of linear transmission,resulting in a much largerβeff.In particular,for the MoS 2-PS/PMMA film,βeff were 407.70 cm/GW at 532 nm(100.69 cm/GW for MoS 2-PMMA and 116.55 cm/GW for MoS 2/PS/PMMA)and 429.64 cm/GW at 1 064 nm(-48.92 cm/GW for MoS 2-PMMA and 66.31 cm/GW for MoS 2/PS/PMMA).A larger OL effect,with thresholds of about 0.92 GW/cm 2 at 532 nm and about 1.12 GW/cm 2 at 1 064 nm,was also achieved from the MoS 2-PS/PMMA film.The annealing treatment on the MoS 2-PS film resulted in the considerable enhancement of its NLO and OL performance.The achievedβeff and OL thresholds were 455.67 cm/GW at 532 nm and 448.90 cm/GW at 1 064 nm;and 1.07 GW/cm 2 at 532 nm and 0.87 GW/cm 2 at 1 064 nm,respectively.
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