文献类型：期刊文献

中文题名：等离子喷涂技术的新进展

英文题名：Recent Development on Plasma Spray Technology

作者：杨洪伟[1];栾伟玲[1];涂善东[1]

机构：[1]华东理工大学机械与动力工程学院,上海200237

年份：2005

卷号：34

期号：6

起止页码：7

中文期刊名：表面技术

外文期刊名：Surface Technology

收录：CSTPCD;;CSCD:【CSCD_E2011_2012】；

基金：国家杰出青年基金资助项目(50225517)

语种：中文

中文关键词：等离子喷涂;纳米涂层;功能涂层

外文关键词：Plasma spray; Nanometer coating; Functional coating

摘要：介绍等离子喷涂技术的最新应用和等离子喷涂设备的发展,综述了该技术的研究热点,指出涂层中的缺陷对材料性能的影响,并提出了工艺改进措施。最后,对等离子喷涂领域中几个重要的发展方向进行了展望。
In this paper, the application of plasma spray technology as well as the updated plasma spray equipments are introduced. Several research focuses on plasma spray technology are summaried. The influences of various flaw on the property of coating are pointed out, and some improvements on the technics are put forward. At last, several developing trends about plasma spray are proposed.