文献类型：期刊文献

英文题名：Tuning the glass transition temperature of two-photon polymerized elastomers for tailorable mechanical properties and enhanced recovery

作者：Long, Yu[1,2];Wang, Tao[1,3];Wang, Yan[1];Huang, Xiaolong[1];Gong, Zhongyan[1];Ma, Zhiyuan[1];Lei, Yu[1];Deng, Biwei[1];Li, Yan[2]

机构：[1]Yongjiang Lab, Ningbo 315202, Peoples R China;[2]Tongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China;[3]East China Univ Sci & Technol, Sch Chem Engn, State Key Lab Green Chem Engn & Ind Catalysis, State Key Lab Chem Engn, Shanghai 200237, Peoples R China

年份：2026

卷号：540

外文期刊名：CHEMICAL ENGINEERING JOURNAL

收录：;EI(收录号：20262120763949);WOS:【SCI-EXPANDED(收录号:WOS:001790949300001)】；

基金：The authors acknowledge the financial support from National Natural Science Foundation of China Grant 52305287; the Zhejiang Provincial Natural Science Foundation Grant LQ23F050012; Yongjiang Laboratory Grant B400EASE01 and B400EASE02; Ningbo Natural Science Foundation Grant 2022J063. The authors also acknowledge the support of Materials Analysis and Testing Center of Yongjiang Laboratory for multi-scale characterization services, and the Micro-nano Fabrication Center of Yongjiang Laboratory for phase angle analysis services.

语种：英文

外文关键词：Two-photon polymerization; polymer architecture; elastomer photoresist; 3D printing; mechanical performance

摘要：Two-photon polymerization (TPP) has attracted increasing attention and research interest due to its high-resolution fabrication capability at the micro/nanoscale. While rigid photocurable monomers are often used to enhance mechanical performance, they can lead to modulus mismatch that limits applicability in flexible devices. In this work, a series of polyurethane acrylate (PUA) oligomers with different molecular weights are synthesized, enabling the tuning of storage modulus (25 degrees C) across three orders of magnitude. These oligomers form the basis of a solvent-free elastomeric photoresist (G-PCLx), suitable for photoresist-immersion printing (i.e., the objective lens is directly immersed in the photoresist droplet). In situ compression tests reveal that micro-pillars fabricated from the G-PCL1000 exhibit exceptional damage tolerance, sustaining 54% measured strain without structural collapse and achieving recovery rates up to 85%. Complex architectures, such as fullerene spheres and Kelvin lattices, maintain structural integrity under 60% set strain, developing only minor cracks (1-1.5 um length) without structural failure. The achieved mechanical robustness originates from the glass transition temperature of the PUA oligomer near room temperature (similar to 25 degrees C), which promotes segmental mobility within the crosslinked network. This design provides an effective strategy for fabricating high-precision, flexible microstructures at room temperature.