详细信息

INCREMENTAL GEOMETRIC MODELING AND MASK SYNTHESIS FOR SURFACE MICROMACHINED MEMS  ( CPCI-S收录 EI收录)  

文献类型:会议论文

英文题名:INCREMENTAL GEOMETRIC MODELING AND MASK SYNTHESIS FOR SURFACE MICROMACHINED MEMS

作者:Li, Jianhua[1];Ling, Hao[1];Du, Zhengchun[2]

机构:[1]E China Univ Sci & Technol, Dept Comp Sci & Engn, Shanghai 200237, Peoples R China;[2]Shanghai Jiao Tong Univ, Sch Mech Engn, Shanghai 200240, Peoples R China

会议论文集:ASME Design Engineering Technical Conferences and Computers and Information in Engineering Conference (DETC)

会议日期:AUG 17-20, 2014

会议地点:Buffalo, NY

语种:英文

外文关键词:Electromechanical devices - Geometry - Mapping

摘要:In the design of surface micromachined microelectromechanical systems (MEMS), there is a lack of effective modeling methods to refine the geometry of a MEMS device. This paper presents a method of incremental geometric modeling and mask synthesis for surface micromachined MEMS. In this method, propagation-mapping graphs are introduced to label all the affected entities in one variation operation, according to the characteristic of surface micromachining. Based on the propagation-mapping graphs constructed from a 3D geometric model and its process model, variation propagation and mapping are used to update these models. In order to keep manufacturability of these models, four manufacturability problems caused by variation propagation are analyzed and a manufacturability maintenance method is discussed. Variation propagation and mapping achieve incremental modeling for the geometric model and process model of a MEMS device. This method enables designers to modify a MEMS device in a quick and intuitive way. Finally the method is implemented and some test results are given.

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