文献类型：期刊文献

英文题名：Effects of laser irradiation on the structure and optical properties of ZnO thin films

作者：Lu, Hui[1];Tu, Yaoquan[2];Lin, Xian[1];Fang, Bin[3];Luo, Duanbin[1];Laaksonen, Aatto[4]

机构：[1]E China Univ Sci & Technol, Dept Phys, Shanghai 200237, Peoples R China;[2]Univ Orebro, Sch Sci & Technol, S-70182 Orebro, Sweden;[3]E China Univ Sci & Technol, Inst Nucl Phys, Shanghai 200237, Peoples R China;[4]Stockholm Univ, Div Phys Chem, Dept Mat & Environm Chem, S-10691 Stockholm, Sweden

年份：2010

卷号：64

期号：19

起止页码：2072

外文期刊名：MATERIALS LETTERS

收录：;EI(收录号：20103313153396);WOS:【SCI-EXPANDED(收录号:WOS:000281595100012)】；

语种：英文

外文关键词：Thin films; Semiconductors; Laser treatment; Annealing; Microstructure; Optical properties

摘要：The effects of laser irradiation on the surface microstructure and optical properties of ZnO films deposited on glass substrates were investigated experimentally and compared with those of thermal annealing. X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements showed that the irradiation treatment with an Ar+ laser of 514 nm for 5 min improves the crystalline quality of ZnO thin films through increasing the grain size and enhancing the c-axis orientation, with the effects similar to those of the thermal annealing at 500 degrees C for 1 h. Laser irradiation was found to be more effective both for the relaxation of the residual compressive stress in the as-grown films and for the modification of the surface morphology. A significant increase in the UV absorption and a widening in the optical band-gap of the films were also observed after laser irradiation. (C) 2010 Elsevier B.V. All rights reserved.