文献类型：期刊文献

英文题名：Laminar flow used as "liquid etch mask" in wet chemical etching to generate glass microstructures with an improved aspect ratio

作者：Mu, Xuan[1,2];Liang, Qionglin[1];Hu, Ping[3];Ren, Kangning[1];Wang, Yiming[1];Luo, Guoan[1,2]

机构：[1]Tsinghua Univ, Dept Chem, Key Lab Bioorgan Phosphorus Chem & Chem Biol, Minist Educ, Beijing 100084, Peoples R China;[2]E China Univ Sci & Technol, Sch Pharm, Shanghai 200237, Peoples R China;[3]E China Univ Sci & Technol, Coll Chem & Mol Engn, Shanghai 200237, Peoples R China

年份：2009

卷号：9

期号：14

起止页码：1994

外文期刊名：LAB ON A CHIP

收录：;WOS:【SCI-EXPANDED(收录号:WOS:000267572000004)】；

基金：The authors would like to acknowledge the projects of National Basic Research Program (973 Program) of China (2007CB714505) and Ministry of Education of China (No. 20080031012). M.X. thanks Prof .Yao Bo (Zhejiang University) and Prof. Pu Qiaosheng (Lanzhou University) for helpful discussion.

语种：英文

摘要：A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as "liquid etch mask". Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to similar to 1 while in an inexpensive and convenient manner.