文献类型：期刊文献

英文题名：Fabrication of high-performance ALD-Al2O3/SiO2 nanolaminate coating for atomic oxygen erosion resistance on polyimide

作者：Yan, Chi[1];Li, Jialin[1];Dai, Yuhao[1];Lan, Zhijiang[2];Wang, Haobo[1];Tong, Hua[1];Ye, Xiaojun[1];Yuan, Xiao[1];Liu, Cui[1];Li, Hongbo[1]

机构：[1]East China Univ Sci & Technol, Sch Mat Sci & Engn, Shanghai 200237, Peoples R China;[2]Optorun Semicond Syst Corp, Shanghai 200400, Peoples R China

年份：2025

卷号：502

外文期刊名：SURFACE & COATINGS TECHNOLOGY

收录：;EI(收录号：20250917938769);WOS:【SCI-EXPANDED(收录号:WOS:001433894100001)】；

基金：This work was financed by the Science and Technology Commission of Shanghai Municipality, China [Grant No. ZJ2022-ZD-010] . The authors thank Shiyanjia Lab ( www.shiyanjia.com ) for assisting with the XPS analysis. The authors thank the Optorun Semiconductor System Corporation for its support in the atomic layer deposition experiment.

语种：英文

外文关键词：Polyimide; Atomic layer deposition (ALD); Atomic oxygen; SiO2

摘要：Polyimide (PI), commonly used in space applications, is vulnerable to atomic oxygen (AO) erosion in low Earth orbit, causing performance degradation. Atomic layer deposition (ALD) of ultrathin films has great potential as AO protective coatings for aerospace materials. In this study, nanometer-thick plasma-enhanced atomic layer deposition (PEALD) SiO2 films were deposited on in-situ oxygen plasma-activated PI surfaces. The nucleation and growth process of SiO2 was systematically analyzed. A uniform and dense SiO2 film was formed, providing limited resistance to AO erosion, but not sufficient for extreme environmental conditions. To further enhance AO resistance, we introduced thermal ALD-Al2O3 interlayers within the same processing window and alternately deposited conformal, continuous Al2O3/SiO2 nanolaminates on the PI surface. The Al2O3 interlayer effectively reduced the film deposition roughness, forming a smoother, denser barrier layer and minimizing growth defects. This dense ALD-Al2O3/SiO2 nanolaminate, with its inert Si-O-Al bonds, effectively prevents AO from penetrating the substrate, showing superior protection under long-term AO exposure. After AO irradiation, the surface remained smooth with no obvious defects or voids, effectively avoiding undercutting caused by AO. The synergistic effect of alumina and silica provides excellent AO protection while maintaining good optical transmittance.