文献类型：期刊文献

英文题名：Effect of thermal annealing on the microstructure, mechanical properties and residual stress relaxation of pure titanium after deep rolling treatment

作者：Huang, Jie[1];Zhang, Kai-Ming[1];Jia, Yun-Fei[1];Zhang, Cheng-Cheng[3];Zhang, Xian-Cheng[1];Ma, Xian-Feng[2];Tu, Shan-Tung[1]

机构：[1]East China Univ Sci & Technol, Sch Mech & Power Engn, Key Lab Pressure Syst & Safety, Minist Educ, Shanghai 200237, Peoples R China;[2]Sun Yat Sen Univ, Sinofrench Inst Nucl Engn & Technol, Zhuhai 519082, Guangdong, Peoples R China;[3]AECC Commercial Aircraft Engine Co Ltd, Shanghai Engn Res Ctr Commercial Aircraft Engine, Shanghai 201108, Peoples R China

年份：2019

卷号：35

期号：3

起止页码：409

外文期刊名：JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY

收录：;EI(收录号：20184906211273);WOS:【SCI-EXPANDED(收录号:WOS:000454506800024)】；

基金：This work was financially supported by the National Natural Science Foundation of China (Nos. 51725503 and 51575183) and the "111 Project". The author, Xian-Cheng Zhang is also grateful for the support by the Shanghai Pujiang Program, Young Scholar of the Yangtze River Scholars Program, and Shanghai Technology Innovation Program of SHEITC (No. CXY-2015-001).

语种：英文

外文关键词：Deep rolling; Ultra-fine grain; Tensile strength; Microstructure; Residual stress

摘要：The aim of this paper was to investigate the effect of thermal annealing on the microstructure, mechanical properties, and residual stress relaxation of deep rolled pure titanium. The microstructure and mechanical properties of the surface modified layer were analyzed by metallographic microscopy, transmission electron microscope and in-situ tensile testing. The results showed that the annealed near-surface layer with fine recrystallized grains had increased ductility but decreased strength after annealing below the recrystallization temperature, where the tensile strength was still higher than that of the substrate. After annealing at the recrystallization temperature, the recrystallized near-surface layer had smaller grain size, similar tensile strength, and higher proportional limit, comparable to those of the substrate. Moreover, the residual stress relaxation showed evidently different mechanisms at three different temperature regions: low temperature (T <= 0.2 T-m), medium temperature (T approximate to (0.2-0.3) T-m), and high temperature (T >= 0.3 T-m). Furthermore, a prediction model was proposed in terms of modification of Zener-Wert-Avrami model, which showed promise in characterizing the residual stress relaxation in commercial pure Ti during deep rolling at elevated temperature. (C) 2018 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.