文献类型：专利

英文题名：Boron diffusion source for spin-on boron diffusion process, comprises complex formed from polyol, boric acid and binary alcohol ether solvent, and is prepared by pouring boric acid into solvent, dissolving, adding polyol, and heating

作者：TONG H;SUN X;YANG Y;YUAN S;YUAN X;ZHAO H

机构：[1]UNIV EAST CHINA SCI & TECHNOLOGY

申请号：CN108257857-A

申请日：2018-01-11

公开日：2018-07-06

语种：英文

收录：DERWENT

摘要：NOVELTY - A boron diffusion source comprises complex formed from polyol, boric acid and binary alcohol ether solvent, and is prepared by pouring boric acid into solvent, stirring, dissolving, adding polyol into the solution, heating and stirring, stopping heating and continuously stirring at room temperature. USE - Boron diffusion source used for spin-on boron diffusion process. ADVANTAGE - The boron diffusion source has high concentration and high purity. The preparation is simple, easy and economical, requires mild conditions, and is suitable for large scale industries. The boron source has square resistance of 30-150 ( Omega )/square which is obtained on an n-type silicon wafer having resistivity of 1-3 Omega .cm, and p-n junction length of 0.1-0.5 mu m.