文献类型：期刊文献

中文题名：低压化学蒸气淀积(LPCVD)反应器的模拟和分析

英文题名：Modeling and Analysis of LPCVD Reactors

作者：朱开宏[1];陈良恒[1];袁渭康[1]

机构：[1]华东化工学院

年份：1989

卷号：40

期号：5

起止页码：540

中文期刊名：化工学报

外文期刊名：CIESC Journal

收录：CSTPCD;;Scopus;北大核心:【北大核心1992】；CSCD:【CSCD2011_2012】；

基金：国家自然科学基金资助

语种：中文

中文关键词：低压化学蒸气淀积;反应器;模拟;衬底;扩散-反应处理

摘要：本文利用低压化学蒸气淀积(LPCVD)反应器中衬底间隙内的扩散-反应过程和环形通道内的质量、热量传递过程的数学模型对片内和片间均匀性问题进行了分析。结果表明:片内均匀性h和片内效率因子n均可用体积变化准数和扩散准数的函数表示。合理设置管外加热装置,可改善片间均匀性或提高反应气流的转化率。这些结果可用于指导低压化学蒸气淀积反应器的设计和操作参数的选择 ,
In this paper the uniformity within and among the wafers in LPCVD reactors is analyzed by means of mathematical models, which describe the diffusion-reaction process between two adjacent wafers and mass, heat transport in the annular flow region. Results indicate that the uniformity h and effectiveness factorη within each wafer can be represented as function of volume change modulus ε and diffusion modulus φ; approprately installing heating device out of reactor tube can improve the uniformity from wafer to wafer or increase the conversion of reactant, These conclusions can serve as guidance tor design of LPCVD reactors and selection of operation parameters.