文献类型：期刊文献

中文题名：Radiation Losses in Ohmically Heated Plasma in the HT-7 Tokamak

英文题名：Radiation losses in ohmically heated plasma in the HT-7 tokamak

作者：Zhang, Xianmei[1,2]; Wan, Baonian[2]; Feng, Xiaojuan[1]

机构：[1] Department of Physics, East China University of Science and Technology, 200237 Shanghai, China; [2] Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China

年份：2004

卷号：6

期号：2

起止页码：2194

中文期刊名：Plasma Science and Technology

外文期刊名：Plasma Science and Technology

收录：EI(收录号：20063110039489);Scopus;CSCD:【CSCD2011_2012】；

基金：The project supported by the Meg-Science Engineering Project of the Chinese Academy of Sciences

语种：英文

中文关键词：impurities in plasma;radiationloss;tokamak

外文关键词：Boron - Carrier concentration - Electric discharges - Impurities - Plasmas - Silicon - Tokamak devices

摘要：Total radiation losses in ohmically heated plasma have been investigated in the HT-7 tokamak after different wall conditionings. Discharges after siliconization and boronization have been studied by using bolomitric measurements. Not only low-Z impurities but also high-Z impurities are reduced obviously after wall conditioning. The fraction of the total radiation loss to the ohmic input increases with increasing line-averaged central electron density. But it decreases with increasing the plasma current IP after wall conditionings. It is slightly lower for a boronized wall than that for a siliconized wall.
Total radiation losses in ohmically heated plasma have been investigated in the HT-7 tokamak after different wall conditionings. Discharges after siliconization and boronization have been studied by using bolomitric measurements. Not only low-Z impurities but also high-Z impurities are reduced obviously after wall conditioning. The fraction of the total radiation loss to the ohmic input increases with increasing line-averaged central electron density. But it decreases with increasing the plasma current IP after wall conditionings. It is slightly lower for a boronized wall than that for a siliconized wall.