文献类型：期刊文献

英文题名：Optimal Control of a Chemical Vapor Deposition Reactor for Polysilicon Production Based on Adaptive Dynamic Programming Method

作者：Zhang, Yuze[1]; Peng, Xin[1]; Liu, Hu[2]; Xue, Dong[1]; Zhong, Weimin[1]

机构：[1] East China University of Science and Technology, Shanghai, China; [2] Xinjiang Gones Energy Technology Co.,Ltd, Xinjiang, China

年份：2025

起止页码：338

外文期刊名：CFIMA 2024 - Proceedings of 2024 2nd International Conference on Frontiers of Intelligent Manufacturing and Automation

收录：EI(收录号：20250817897006)

语种：英文

外文关键词：Adaptive control systems - Dynamic programming - Hard facing - Optimal control systems - Surface analysis - Surface temperature - Thermal variables control

摘要：To solve the optimal control problem of the surface temperature of silicon rods in polysilicon production, an adaptive dynamic programming (ADP) scheme is proposed. The electric heating and chemical vapor deposition mechanism model are designed firstly to simulate the internal production processes of the Siemens reactor. Due to the computational complexity of mechanistic modeling, an integrated surrogate model is proposed to reduce model interaction time. Considering the nonlinearity in the Siemens Reactor production process, an adaptive dynamic programming controller is employed to approximate the optimal control policy and value function. The results demonstrate that the proposed integrated surrogate model enables efficient approximation of the production process, and the adaptive dynamic programming controller is capable of achieving optimal control of the surface temperature of silicon rods. This approach has the potential to enhance both production safety and product quality by reducing temperature control instability. ? 2024 Copyright held by the owner/author(s).