文献类型：期刊文献

中文题名：柠檬酸络合法制备可见光响应型光催化剂CuO/BiVO_4

英文题名：Fabrication of CuO/BiVO_4 Photocatalysts Under Visible-light-responsivity Through Citric Acid Complexometry

作者：刘红岩[1];余蓉蓉[2,3];吴秋芳[1,2,3]

机构：[1]华东理工大学化工学院,上海200237;[2]国家超细粉末工程研究中心;[3]上海华明高技术(集团)有限公司,上海200231

年份：2011

卷号：39

期号：12

起止页码：1974

中文期刊名：硅酸盐学报

外文期刊名：Journal of The Chinese Ceramic Society

收录：CSTPCD;;EI(收录号：20120114659100);Scopus;北大核心:【北大核心2008】；CSCD:【CSCD2011_2012】；

基金：上海市科委纳米专项(0952nm00600);上海市科学技术委员会资助的青年科技启明星(11QB1402500)资助项目

语种：中文

中文关键词：氧化铜/钒酸铋;可见光响应;铜掺杂:光催化活性;柠檬酸络合法

外文关键词：copper oxide/bismuth vanadate; visible-light-responsive; Cu-doped; photocatalytic activity; citric acid complexometry

摘要：以Bi(NO3)3.5H2O和NH4VO3为原料,采用柠檬酸络合法制备新型可见光响应型复合光催化剂CuO/BiVO4。借助X射线衍射、全谱直读等离子体发射光谱仪、X射线光电子能谱仪、扫描电子显微镜、透射电子显微镜和紫外-可见漫反射光谱等表征粉体的结构和性能。结果表明:不同Cu摩尔掺量的复合光催化剂仍保持纯单斜晶系白钨矿结构;掺杂Cu主要以CuO形式存在,且其实际含量与理论掺量基本一致;复合光催化剂平均一次粒径约200nm,比纯BiVO4的吸收边都有不同程度地红移。以10mg/L亚甲基蓝染料溶液为目标污染物,研究纯BiVO4和CuO/BiVO4的可见光催化活性,一定量Cu掺杂的催化剂活性明显优于纯BiVO4的,当Cu掺量为0.2%、可见光照射150min后,染料脱色率可达到88%以上,比纯BiVO4的提高约20%。
Novel designed composite photocatalysts CuO/BiVO 4 under visible-light-responsivity were prepared by citric acid com- plexometry using Bi（NO3）3·5H2O and NH4VO3 as raw materials. The as-prepared nanopowders were characterized by X-ray diffrac- tion, inductively coupled plasma mass spectrometry, X-ray photoelectron spectroscopy, scanning electro microscopy, transmission electron microscopy, and ultraviolet-visible absorption spectroscopy. Results indicate that composite photocatalysts with different Cu dosages are still pure monoclinic structure, and that Cu exists as CuO with its practical content equal to the theoretic dosage, its average particle size is 200 nm. Compared with pure BiVO 4 , the absorption red-shift edge was obtained in different Cu-doped composite photocatalysts. Photocatalytic activity between pure BiVO 4 and CuO/BiVO4 was studied using methylene blue solution （MB） of 10 mg/L as simulation pollutants. The photocatalytic activity of CuO/BiVO 4 is obviously better than that of pure BiVO4 . When Cu-doped mole fraction is 0.2%, removal rate of MB is above 88% under 150 min visible-light irradiation, which is 20% higher than that of pure BiVO4 .