详细信息

氟掺杂纳米TiO_2薄膜的低温制备及其光催化性能    

Low-Temperature Preparation and Photocatalytic Performance of F-Doped Nanosized TiO_2 Thin Film

文献类型:期刊文献

中文题名:氟掺杂纳米TiO_2薄膜的低温制备及其光催化性能

英文题名:Low-Temperature Preparation and Photocatalytic Performance of F-Doped Nanosized TiO_2 Thin Film

作者:陈艳敏[1];钟晶[1];陈锋[1];张金龙[1]

机构:[1]华东理工大学精细化工研究所,结构可控先进功能材料及其制备教育部重点实验室,上海200237

年份:2010

卷号:31

期号:1

起止页码:120

中文期刊名:催化学报

收录:CSTPCD;;Scopus;北大核心:【北大核心2008】;CSCD:【CSCD2011_2012】;

基金:国家自然科学基金(20777015)

语种:中文

中文关键词:氟;掺杂;二氧化钛;薄膜;光催化;罗丹明B;降解

外文关键词:fluorine; doping; titanium dioxide; thin film; photocatalysis; rhodamine B; degradation

摘要:以氟化铵为氟源,采用水热法制得氟掺杂TiO2(FTO)溶胶,并通过浸渍提拉法在低温下制备了FTO薄膜.其中在120oC下水热处理10h所得的TiO2溶胶制备的薄膜均匀透明,具有较高的光催化活性.氟掺杂后的TiO2晶粒尺寸并未发生明显变化,但薄膜的光催化活性显著升高.F/Ti摩尔比为0.01时,FTO薄膜的光催化活性最高,比TiO2薄膜的活性升高了23%.X射线光电子能谱结果表明,氟掺杂TiO2中的氟离子存在晶格取代掺杂和表面化学吸附两种形式.这两种氟离子的共同作用是FTO薄膜光催化活性升高的主要原因.
F-doped TiO2 (FTO) sol was prepared using NH4F as the fluorine precursor by a hydrothermal method. FTO thin film was then prepared via dip-coating. The TiO2 thin film prepared from the TiO2 sol that was hydrothermally treated at 120 ℃ for 10 h had preferable transparence and high photocatalytic activity. F doping did not significantly change the grain size of TiO2 but greatly enhanced the photocatalytic activity of the TiO2 film. The optimal doping concentration of F corresponded to F/Ti molar ratio of 0.01. The photocatalytic activity of the FTO thin film was 23% higher than that of TiO2 thin film. X-ray photoelectron spectroscopy results showed that there were two forms of F element in the FTO thin film: surface chemically adsorbed F and substituent lattice F. Both surface adsorbed F and substituent lattice F played a role in the photocatalytic activity enhancement of the FTO thin film.

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