文献类型：期刊文献

中文题名：辉光放电光谱法定量分析金属材料表面纳米级薄膜的研究

英文题名：STUDY OF ANALYSIS OF NANO FILM ON METAL SURFACE BY GLOW DISCHARGE EMISSION SPECTROMETRY

作者：何晓蕾[1];张毅[2];蓝闽波[1];陈英颖[2];邬君飞[2];王艳萍[1]

机构：[1]华东理工大学分析测试中心,上海200237;[2]宝钢研究院,上海201900

年份：2006

卷号：42

期号：9

起止页码：693

中文期刊名：理化检验（化学分册）

外文期刊名：Physical Testing and Chemical Analysis(Part B:Chemical Analysis)

收录：CSTPCD;;北大核心:【北大核心2004】；CSCD:【CSCD_E2011_2012】；

语种：中文

中文关键词：辉光放电光谱法;纳米级薄膜;表面分析

外文关键词：Glow discharge emission spectrometry; Nano film; Surface analysis

摘要：介绍了利用辉光放电光谱法分析金属材料表面的纳米级薄膜。通过优化辉光光源的放电参数,计算标准样品的溅射率。溅射率经校正后,建立各元素的标准工作曲线,从而形成了纳米级薄膜的定量表面分析方法。试验证明,此方法对膜厚的测定具有很好的准确度和精密度,可应用于多种金属材料表面纳米级薄膜的研究。
A method of glow discharge （GD） emission spectrometry for the analysis of nano film on metal surface was discribed in this paper. Analytical parameters of the GD source were optimized. The sputtering yield was experimentally determined for establishing corrected calibration curves. It was experimentally verified that the proposed method has good accuracy and precision in film thickness determination. The method has been applied to the analysis of nano film on the surface of several metal meterials.