详细信息

照相明胶层中金催化的无电沉积的正电子湮没研究    

Studies on Electroless Deposition Catalyzed by Gold in Photographic Gelatin Layer with Positron Annihilation

文献类型:期刊文献

中文题名:照相明胶层中金催化的无电沉积的正电子湮没研究

英文题名:Studies on Electroless Deposition Catalyzed by Gold in Photographic Gelatin Layer with Positron Annihilation

作者:张宜恒[1];宫竹芳[2];张广祥[1];姜志全[1];徐绪国[1];阎天堂[1];俞书勤[3];庄思永[4];彭必先[5]

机构:[1]中国科学技术大学应用化学系,合肥230026;[2]中国科学技术大学近代物理系,合肥230026;[3]中国科学技术大学化学物理系,合肥230026;[4]华东理工大学精细化工研究所,上海200237;[5]中国科学院感光化学研究所,北京100101

年份:2000

卷号:21

期号:5

起止页码:766

中文期刊名:高等学校化学学报

外文期刊名:Chemical Journal of Chinese Universities

收录:CSTPCD;;Scopus;北大核心:【北大核心1996】;CSCD:【CSCD2011_2012】;

基金:国家自然科学基金!(批准号:29876038)

语种:中文

中文关键词:无电沉积;正电子湮没技术;照相明胶;铜

外文关键词:Electroless deposition; Positron annihilation technology; Photographic gelatin

摘要:采用正电子湮没技术(PAT)研究了照相明胶中的自由体积空穴在无电沉积过程中的作用机理.研究 结果表明,活化饱和后,照相明胶的自由体积空穴的平均尺寸约减小0.011nm3,相当于一个 Au原子的体 积的大小,即照相明胶大分子中的每个自由体积空穴平均被填充了一个Au原子,该Au原子作为催化活性 核催化铜的沉积,使物理显影生成的影像为紧密铜粒子的堆积形貌,而不是丝状形貌.铜经无电沉积饱和 后,照相明胶的自由体积空穴的平均大小约减小了 0.020 nm3,即照相明胶的自由体积空穴对铜物理显影过 程中铜的沉积没有阻碍作用,铜无电沉积近似为各向同性的球状堆积.
The mechanism of action of free volume holes in photographic gelatin on the electroless deposition process has been studied by Positron Annihilation Technology (PAT) in this paper. The results show that after complete activation, the average volume of the free volume holes in photographic decreas- es by about 0. 011 nm3, which is equivalent to the volume of a gold atom. In the view of statistical average concept, every free volume hole is filled with a gold atom to catalyze the electroless copper deposition. Thus the imaging feature formed in the physical development is not filament, but spherical stacks. After electroless copper deposition is accomplished, the average volume of the free volume holes in photographic gelatin decreases by about 0. 020 nm3, which is equivalent to the volume of three copper atom. Therefore the deposition of copper in isotropic and spherical form was not hindered by free volume holes in photographic gelatin.

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