文献类型：专利

英文题名：Silsesquioxane-multi-aryne hydride resin for high-temperature resistance material, wave-transmitting material and radiation-resistance material used for aeronautics, astronautics, electronics and automobiles, is new

作者：HUANG F;DU L;ZHOU Y;HANG X;DENG S

机构：[1]UNIV EAST CHINA SCI & TECHNOLOGY;[2]SHANGHAI SPACEFLIGHT TECHNOLOGY

申请号：CN101134816-A

申请日：2007-08-22

公开日：2008-03-05

语种：英文

收录：DERWENT

摘要：NOVELTY - A silsesquioxane-multi-aryne hydride resin (1) is new. USE - Silsesquioxane-multi-aryne hydride resin for resin matrix composite such as high-temperature resistance material, wave-transmitting material and radiation-resistance material (claimed) used for aeronautics, astronautics, electronics and automobiles. ADVANTAGE - The silsesquioxane-multi-aryne hydride resin has excellent high-temperature resistance, radiation resistance and wave-transmittance. DETAILED DESCRIPTION - A silsesquioxane-multi-aryne hydride resin of formula (1) is new. X=-OSi(CH3)2H. An INDEPENDENT CLAIM is included for manufacture of silsesquioxane-multi-aryne hydride resin.