文献类型：期刊文献

中文题名：基于图案化宾主液晶的光刻掩膜板制备

英文题名：Fabrication of photomask based on patterned guest-host liquid crystal

作者：王俊辉[1];刘璇[2];段霞[1];李博远[1];袁丛龙[1];郑致刚[1]

机构：[1]华东理工大学物理学院,上海200237;[2]华东理工大学材料科学与工程学院,上海200237

年份：2025

卷号：40

期号：6

起止页码：846

中文期刊名：液晶与显示

外文期刊名：Chinese Journal of Liquid Crystals and Displays

收录：;WOS:【ESCI(收录号:WOS:001514265200004)】；北大核心:【北大核心2023】；

基金：Supported by National Key Research and Development Program of China (No.2022YFA1203700); National Science Foundation of China (No.T2488302, No.62275081, No.62035008); Innovation Program of Shanghai Municipal Education Commission, Scientific Committee of Shanghai (No.2021-01-07-00-02-E00107);"Shuguang Program" of Shanghai Education Development Foundation, and Shanghai Municipal Education Commission (No.21SG29); Shanghai Sailing Program (No.24YF2709100); Postdoctoral Fellowship Program of CPSF (No.GZB20240218)

语种：中文

中文关键词：宾主液晶;掩模板;光取向;微纳结构

外文关键词：guest-host liquid crystal;photomask;photoalignment;micro-nano structures

摘要：微纳结构在诸多领域中发挥着重要作用,尤其是在光学、传感、显示等领域。尽管已有多种技术用于微纳结构的制造,但如何以简便且低成本的方式构建这些微纳结构仍面临着挑战。针对这一问题,本文提出了一种基于图案化取向宾主液晶的设计方案,成功实现了按需构筑的掩模板制备。具体而言,利用宾主液晶对偏振光的各向异性吸收特性,通过光取向技术控制液晶分子的指向矢分布,从而实现对入射光场的空间强度调控,形成图案化的掩模板。将其引入激光直写系统,成功地在光刻胶表面形成多种几何图案的微纳结构。所制备的结构与设计的掩模板高度一致,展现出微米级(特征尺寸5μm)的结构制造能力,并且基于微纳结构制作的液晶光栅能在短波条件下稳定衍射。该结果进一步证明所开发的液晶掩模板能够精准调控空间光场的分布,实现对入射光强度的精准控制。该研究为经济实用的微结构加工提供了一种全新的思路,有望推动复杂微纳结构大面积快速制备技术的发展。
Micro-nano structures play a crucial role in numerous fields,particularly in optics,sensing,and display technologies.Although various techniques have been developed for micro-nano structure fabrication,achieving these structures through simple and low-cost approaches remains a significant challenge.To address this issue,this paper proposes a design based on patterned oriented guest-host liquid crystals,which successfully realizes the preparation of mask templates constructed on demand.Specifically,the patterned mask is successfully established through the combination of the anisotropic absorption characteristics of guest-host liquid crystals to polarized light and the photo-alignment technology,achieving precise spatial intensity regulation of the incident light field.By introducing it into the laser direct writing system,micro-nano structures with various geometric patterns were successfully formed on the surface of the photoresist.The structure is in close agreement with the predefined mask,demonstrating the capability of structural manufacturing at the micron level(feature size 5μm).In addition,the self-assembly of liquid crystal on the micro-nano structure enable period grating,thereby achieving stable diffraction under short-wavelength conditions.This result further demonstrates that the designed liquid crystal mask can achieve precise control over the intensity of incident light by accurately modulating the spatial distribution of the optical field.This study provides a novel and cost-effective approach for microstructure fabrication,offering new opportunities for the development of large-area,rapid manufacturing techniques for complex micro-nano structures.