文献类型：期刊文献

中文题名：反应溅射Zr-Si-N复合膜的微结构与力学性能

英文题名：Microstructures and Mechanical Properties of Zr-Si-N Films Prepared by Reactive Sputtering

作者：刘艳[1];董云杉[1];黄家桢[2];张利中[2];李戈扬[1]

机构：[1]上海交通大学金属基复合材料国家重点实验室,上海200030;[2]华东理工大学分析测试中心,上海200237

年份：2006

卷号：26

期号：3

起止页码：200

中文期刊名：真空科学与技术学报

外文期刊名：Chinese Journal of Vacuum Science and Technology

收录：CSTPCD;;EI(收录号：20063710103149);Scopus;北大核心:【北大核心2004】；CSCD:【CSCD_E2011_2012】；

基金：国家自然科学基金(No.50571062)

语种：中文

中文关键词：Zr-Si-N薄膜;反应溅射;微结构;力学性能

外文关键词：Zr-Si-N films, Reactive sputtering, Microstructure, Mechanical properites

摘要：在Ar、N2混合气氛中,通过双靶反应磁控溅射方法制备了一系列不同Si含量的Zr-Si-N复合薄膜,采用EDS、XRD、SEM、AFM和微力学探针表征了复合膜的成分、相组成、微结构和力学性能。结果表明:随着Si的加入,Si3N4界面相形成于ZrN晶粒表面并阻止其长大。低Si含量下,晶粒的细化使Zr-Si-N薄膜得到强化,在Si含量为6.2at%时其硬度和弹性模量分别达到最高值29.8 GPa和352 GPa。继续增加Si的含量,薄膜逐渐向非晶态转变,同时产生ZrxSiy相,并伴随有明显的力学性能降低。Zr-Si-N薄膜力学性能增加受到限制,可能与Si3N4界面相和ZrN晶粒之间的低润湿性有关。
of Zr-Si-N composite films with different Si contents were grown in an atmosphere of Ar and N2 mixture by reactive magnetron sputtering of a hi-target. The films were characterized with energy dispersive spectroscopy （EDS）, X-ray diffraction （XRD）, scanning electron microscopy （SEM）,atomic force microscopy （AFM） and nano-indentafion. The results show that Si contents significantly affect its mechanical properties. Addition of Si results in formation of Si3N4 on ZrN grain surfaces, which prevents the grains from growing. As Si content decreases,the strength of the Zr-Si-N films increases.For instance, with a Si content of 6.2at% ,both its hardness and its elastic module reach the maxima,29.8 GPa and 352 GPa, respectively, possibly because of small size of the ZrN grains and of existence Si3N4 at the interfaces.While Si contents increases higher than 6.2at%, crystalline Zr-Si-N composite films turn into amorphous films with decreasing mechanical properties possibly because of the low wettability of ZrxSiy at the ZrN grain interfaces.