文献类型：期刊文献

英文题名：Ligand-Engineered Nanoclusters as Photoinitiator and Mechanical Reinforcement for Two-Photon Polymerization

作者：Wang, Tao[1,2];Long, Yu[1];Ma, Zhiyuan[1];Lin, Yuxiao[3];Lei, Yu[1];Xu, Kun[1];Zhang, Lei[1];Li, Jiaxiong[2];Li, Yunsong[4];Cheng, Bingkun[4];Zhu, WeiHong[5,6];Deng, Biwei[1];Xu, Yisheng[2]

机构：[1]Yongjiang Lab, Ningbo, Peoples R China;[2]East China Univ Sci & Technol, Ctr Photosensit Chem Engn, State Key Lab Green Chem Engn & Ind Catalysis, Shanghai, Peoples R China;[3]Jiangsu Normal Univ, Sch Phys & Elect Engn, Xuzhou, Peoples R China;[4]Zhejiang Lab, Hangzhou, Peoples R China;[5]East China Univ Sci & Technol, Sch Chem & Mol Engn, Shanghai Key Lab Funct Mat Chem, Key Lab Adv Mat, Shanghai, Peoples R China;[6]East China Univ Sci & Technol, Inst Fine Chem,Sch Chem & Mol Engn, Ctr Photosensit Chem Engn,Frontiers Sci Ctr Materi, Feringa Nobel Prize Scientist Joint Res Ctr,Joint, Shanghai, Peoples R China

年份：2026

外文期刊名：ADVANCED FUNCTIONAL MATERIALS

收录：;EI(收录号：20262220816820);WOS:【SCI-EXPANDED(收录号:WOS:001778238600001)】；

基金：The authors gratefully acknowledge funding support from Shanghai Science and Technology Innovation Action Plan (24JD1402900), National Natural Science Foundation of China (Grant No. 22305231), and Yongjiang Laboratory (Grant Nos. B400EASE01, B400EASE02, and B400EASA00). We acknowledge the support of the Materials Analysis and Testing Center of Yongjiang Laboratory for multi-scale characterization services. We sincerely thank the beamline BL18B at Shanghai Synchrotron Radiation Facility (SSRF) for Nano-CT measurements. We sincerely thank Dr. Bo Song and Haozhou Jin from the Organic Functional Materials Research Center at Yongjiang Laboratory for their great support and valuable assistance in experimental characterization during the revision of this manuscript.

语种：英文

外文关键词：ligand engineering; ligand exchange; mechanical metamaterials; nanocluster; two-photon polymerization

摘要：Although two-photon polymerization (TPP) is a flexible micro-nanoscale 3D printing technique, conventional polymeric resists contain permanently embedded organic photoinitiators that adversely affect the mechanical properties of printed structures. Here, we report a novel type of ligand-engineered nanoclusters, which serve simultaneously as the photoinitiators in the TPP resist and as mechanical reinforcement after polymerization. Uniform nanoclusters are liganded with both reactive and photosensitive molecules to achieve combined functions. An enhanced two-photon absorption of 22.45 GM (Goeppert-Mayer) suggests synergistic photoenergy conversion between the nanocluster core and photosensitive ligands. The stable dispersion of the nanoclusters enables high-fidelity 3D printing with a resolution of 141 nm. Covalently bonded interfaces between the nanoclusters and the crosslinked polymer matrix enable outstanding mechanical stiffness and strength for the printed microscale structures. In situ mechanical tests reveal that the well-incorporated nanoclusters result in a 75% enhancement in stiffness and a 105% enhancement in strength. Such a convenient ligand-engineering strategy can go beyond photoinitiation and mechanical reinforcement, enabling new potentials of the TPP technique for the fabrication of high-performance micromechanical devices with diverse applications.