详细信息
Study of the Adsorption Reactions of Thiophene on Cu(I)/HY-Al2O3 by Fourier Transform Infrared and Temperature-Programmed Desorption: Adsorption, Desorption, and Sorbent Regeneration Mechanisms ( SCI-EXPANDED收录)
文献类型：期刊文献
英文题名：Study of the Adsorption Reactions of Thiophene on Cu(I)/HY-Al2O3 by Fourier Transform Infrared and Temperature-Programmed Desorption: Adsorption, Desorption, and Sorbent Regeneration Mechanisms
作者：Tang, Xiao-Lin[1];Shi, Li[1]
机构：[1]E China Univ Sci & Technol, State Key Lab Chem Engn, Shanghai 200237, Peoples R China
年份：2011
卷号：27
期号：19
起止页码：11999
外文期刊名：LANGMUIR
收录：;WOS:【SCI-EXPANDED(收录号:WOS:000295187300036)】；
语种：英文
摘要：This work mainly involved the investigation of the adsorption of thiophene on Cu(I)-supported HY-Al2O3. It demonstrated a high sulfur capacity of 10 mg sulfur/g sorbent when the HY/Al2O3 mass ratio was 3, loaded with 12% copper, calcined at 550 degrees C, and tested at ambient temperature. In situ Fourier transform infrared (FTIR) and temperature-programmed desorption (TPD) results indicated that the adsorption mechanisms on Cu(I)/HY-Al2O3 primarily were pi-complexation and sulfur-adsorbent (S-M; sigma) bonds. Pyridine-FTIR showed the total weak Lewis acid contribution to the Cu(I)/HY-Al2O3 adsorption desulfurization performance.
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