文献类型：期刊文献

中文题名：Directional Photo-manipulation of Self-assembly Patterned Microstructures

作者：Wei Wang[1];Fei Gao[1];Yuan Yao[1];Shao-Liang Lin[1]

机构：[1]Shanghai Key Laboratory of Advanced Polymeric Materials,Key Laboratory for Ultrafine Materials of Ministry of Education,School of Materials Science and Engineering,East China University of Science and Technology,Shanghai 200237,China

年份：2018

卷号：36

期号：3

起止页码：297

中文期刊名：Chinese Journal of Polymer Science

外文期刊名：高分子科学(英文版)

收录：CSTPCD;;Scopus;CSCD:【CSCD2017_2018】；

基金：financially supported by the National Natural Science Foundation of China(Nos.51622301 and 51573046);Projects of Shanghai Municipality(Nos.14SG29 and 17JC400700);Fundamental Research Funds for the Central Universities(No.222201718002)

语种：英文

中文关键词：Self-assembly;Directional photo-manipulation;Surface patterning;Azopolymer

摘要：Highly intricate surface architectures derived from patterned polymer microstructures have received increasing concern in recent years.Directional photo-manipulation(DPM)of azopolymers is one of the effective strategies to tune the patterned polymer microstructures through directional mass migration(DMM)upon polarized light illumination.In this feature article,we emphasize the latest advances of DPM on azopatterns created by self-assembly.The mechanism of DMM,the photo-manipulation performance,and functions of manipulated patterns are introduced in sequence.As presented,DPM can manipulate the as-prepared microstructures feasibly by taking the advantages of non-contacting and nondestructive characters.Moreover,the challenges and opportunities of DPM strategy are discussed in conclusion.