文献类型：期刊文献

英文题名：In-situ fabrication of CNT/TiO₂ interpenetrating network film on nickel substrate by chemical vapour deposition and application in photoassisted water electrolysis

作者：Ma, Lei[1];Chen, Aiping[1];Zhang, Zhe[1];Lu, Jindong[1];He, Hongbo[1];Li, Chunzhong[1]

机构：[1]E China Univ Sci & Technol, Sch Mat Sci & Engn, Minist Educ, Key Lab Ultrafine Mat, Shanghai 200237, Peoples R China

年份：2012

卷号：21

起止页码：27

外文期刊名：CATALYSIS COMMUNICATIONS

收录：;WOS:【SCI-EXPANDED(收录号:WOS:000303031100007)】；

基金：This work was supported by the Special Projects for Nanotechnology of Shanghai (1052mm02400) and National Nature Science Foundation of China (20925621).

语种：英文

外文关键词：CNT/TiO2 interpenetrating network film; In-situ CVD method; Photoassisted water electrolysis; Hydrogen evolution rate

摘要：CNTs/TiO2 interpenetrating network film was in-situ fabricated on nickel substrate by chemical vapour deposition method using TiO2 film doped with iron and nickel as catalyst. The modified Ni substrate was applied as anode in photoassisted water electrolysis. The hydrogen evolution rate of the CNTs/TiO2 film modified anode was ca.2.86 ml/h.cm(2). It was about 2.86 times higher than unmodified Ni anode (ca.1.00 ml/h.cm(2)). The CNTs/TiO2 film was characterized by AFM, FESEM, XRD, Raman and UV-vis. The absorption of TiO2 film in UV region was obviously enhanced by growth of DTI's. The interpenetrating network film was very favorable for photoassisted water electrolysis. (C) 2012 Elsevier B.V. All rights reserved.