详细信息
Electrodeposited Co-Ni layered double hydroxide film with tunable dielectric properties for resistive switching ( SCI-EXPANDED收录 EI收录)
文献类型:期刊文献
英文题名:Electrodeposited Co-Ni layered double hydroxide film with tunable dielectric properties for resistive switching
作者:Mao, Xiaojun[1];Zhang, Yi[1];Chang, Xi[1];Qian, Cheng[1];Gao, Yang[2];Xuan, Xiaoyang[3];Niu, Yueping[1];Gong, Shangqing[1,4,5];Qian, Min[1]
机构:[1]East China Univ Sci & Technol, Sch Phys, Shanghai 200237, Peoples R China;[2]East China Univ Sci & Technol, Sch Mech & Power Engn, Shanghai Key Lab Intelligent Sensing & Detect Tech, Shanghai 200237, Peoples R China;[3]Taishan Univ, Coll Chem & Chem Engn, Tai An 271000, Shandong, Peoples R China;[4]Shanghai Frontiers Sci Ctr Optogenet Tech Cell Met, Shanghai 200237, Peoples R China;[5]Shanghai Engn Res Ctr Hierarch Nanomat, Shanghai 200237, Peoples R China
年份:2025
卷号:23
期号:5
外文期刊名:PHYSICAL REVIEW APPLIED
收录:;EI(收录号:20251918372091);WOS:【SCI-EXPANDED(收录号:WOS:001495114700005)】;
基金:This work was sponsored by a project supported by the Space Application System of China Manned Space Program, National Natural Science Foundation of China (Grant No. 61804054) , supported by the Undergraduate Training Program on Innovation and Entrepreneurship (Grant No. X202310251259) , and the Shanghai Frontiers Science Center of Optogenetic Techniques for Cell Metabolism (Shanghai Municipal Education Commission) .
语种:英文
外文关键词:Dielectric films - Dielectric losses - Dielectric properties of solids
摘要:With the rapid development of data science, higher performance hardware, such as resistive-switching memory with alternative ultrathin materials, emerges. Although the dielectric constant is an important parameter for photoelectric devices, its tunability in a thin film is needed, a method for its measurement in an ultrathin film is lacking, and its relationship with resistive-switching behavior is rarely investigated. Here, a dielectric-property-tunable thickness-controllable continuous Co-Ni layered double hydroxide (LDH) film is achieved by bulk-phase doping of polyvinyl alcohol (PVA) using an electrodeposition method, and a general method for dielectric constant measurement of a thin film based on a parallel-plate capacitor is suggested. The Co-Ni LDH-PVA significantly suppresses dielectric loss by 99%, and an enhanced resistive-switching performance is achieved with an increased initial resistivity, a suppressed leakage current, a reduced set power by 79%, a data retention over 104 s, an endurance up to 200 cycles, and a synapselike capability, compared with pure LDH material. The enhanced electrical performance comes from an improved inherent trade-off of dielectric constants inside an electrodeposited LDH film that is tuned by PVA; this is supported by density-functional calculations. This work provides a reference for the selection and modification of resistive-switching materials in relation to dielectric constants.
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