文献类型：期刊文献

英文题名：Study on the effects of soluble POSS on chain disentanglement in UHMWPE polymerization

作者：Zhou, Jian[1];Zhang, Xian[1];Zhao, Shicheng[1];Ye, Chunlin[1];Zhang, Zhenfei[2];Kuo, Shiao-Wei[3];Xin, Zhong[1]

机构：[1]East China Univ Sci & Technol, Dept Prod Engn, Shanghai Key Lab Multiphase Mat Chem Engn, Shanghai 200237, Peoples R China;[2]Shanghai Res Inst Chem Ind, Shanghai Key Lab Catalysis Technol Polyolefins, State Key Lab Polyolefins & Catalysis, Shanghai 200062, Peoples R China;[3]Natl Sun Yat Sen Univ, Dept Mat & Optoelect Sci, Kaohsiung 804, Taiwan

年份：2022

卷号：244

外文期刊名：POLYMER

收录：;EI(收录号：20220911709043);WOS:【SCI-EXPANDED(收录号:WOS:000783214800002)】；

基金：Acknowledgements This work was financially supported by National Natural Science Foundation of China (Grant 22178108) .

语种：英文

外文关键词：POSS/UHMWPE composite; Melt viscosity; In-situ polymerization

摘要：Polyhedral oligomeric silsesquioxanes (POSS) was added in ultrahigh molecular weight polyethylene (UHMWPE) to intercalate the molecular network and produce chain disentanglement. To avoid agglomeration, the POSS/UHMWPE composites were prepared by in-situ polymerization. In particular, POSS used in this experiment is soluble in the polymerization process, so it can be dispersed in the form of nm-scale in UHMWPE. The reduced melt viscosity and the increased molecular weight between entanglement (M-e) revealed that the addition of POSS can induce the disentanglement of UHMWPE and the optimal content is 0.2 wt%. The isothermal and non isothermal crystallization behavior of nanocomposites were studied by a differential scanning calorimetry (DSC). The crystallization rate and the crystallinity of UHMWPE increased with the addition of POSS, indicating that POSS could act as a nucleating agent in UHMWPE. The annealing study was carried out by a Flash DSC and two melting peaks were observed. The data was analyzed by Arrhenius equation and the POSS/UHMWPE was found to have a lower melting activation energy than neat UHMWPE, proving the disentanglement effect of POSS on UHMWPE.