文献类型：期刊文献

中文题名：A Study of Electron Beam Induced Deposition and Nano Device Fabrication Using Liquid Cell TEM Technology

作者：Xin Chen[1,2,3];Lihui Zhou[4];Ping Wang[5];Hongliang Cao[1];Xiaoli Miao[1];Feifei Wei[1]

机构：[1]Key Laboratory for Ultrafine Materials of Ministry of Education,and Shanghai Key Laboratory of Advanced Polymeric Materials,School of Materials Science and Engineering,East China University of Science and Technology,Shanghai 200237,China;[2]Department of Materials Science and Engineering,University of Illinois at Urbana-Champaign,Urbana,IL 61801,USA;[3]State Key Laboratory of Functional Materials for Informatics,Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences,Shanghai 200050,China;[4]East China University of Science and Technology,Shanghai 200237,China;[5]State Key Laboratory of Bioreactor Engineering,Biomedical Nanotechnology Center,East China University of Science and Technology,Shanghai 200237,China

年份：2014

卷号：32

期号：5

起止页码：399

中文期刊名：Chinese Journal of Chemistry

外文期刊名：中国化学(英文版)

收录：CSTPCD;;Scopus;CSCD:【CSCD2013_2014】；PubMed;

基金：The experiments have been carried out in part in the Frederick Seitz Materials Research Laboratory Central Facilities,University of Illinois,which are partially supported by the U.S.Department of Energy under grants DE-FG02-07ER46453 and DE-FG02-07ER46471;The authors thank S.J.Dillon,Y.Liu,J.Mabon,K.-W.Noh,A.Shah,T.Shang,J.G.Wen,J.M.Zuo for the kind help.The project was supported by Shanghai Leading Academic Discipline Project(B502);Shanghai Key Laboratory Project(08DZ2230500);Fundamental Research Fund of ECUST,Science and Technology Commission of Shanghai Municipality Project(11nm0507000);the Scientific Research Foundation for the Returned Overseas Chinese Scholars,State Education Ministry.

语种：英文

中文关键词：electron beam induced deposition;in situ TEM;nanolithography;nanodevices

摘要：SiCx nano dots and nano wires with sizes from 60 nm to approximately 2μm were fabricated using liquid cell transmission electron microscope(TEM)technology.A SiCl_(4)in CH_(2)Cl_(2)solution was sealed between two pieces of Si_(3)N_(4)window grids in an in situ TEM liquid cell.Focused 200 keV electron beams were used to bombard the sealed precursors,which caused decomposition of the precursor materials,and deposition of the nano materials on the Si_(3)N_(4)window substrates.The size of nano dots increased with beam exposure time,following an approximately exponential relationship with the beam doses.Secondary electrons are attributed as the primary sources for the Si and C reduction.A nano device was formed from a deposited nano wire,with its electrical property characterized.