文献类型：专利

英文题名：Producing patterned graphene comprises irradiating focal point on metal substrate surface with laser beam in the presence of carbon dioxide and moving the beam relative to surface so that focal point is displaced along the pattern

作者：ZHAO C;DONG J;DONG X;QIAN X

机构：[1]UNIV EAST CHINA SCI & TECHNOLOGY

申请号：US2016265103-A1

公开日：2016-09-15

语种：英文

收录：DERWENT

摘要：NOVELTY - Producing a patterned graphene comprises: irradiating at least one focal point on a surface of a metal substrate (140) with a laser beam in the presence of carbon dioxide (130), where the laser beam is generated by an ultra-short pulse laser (110) and moving the laser beam relative to the surface of the metal substrate such that the focal point is displaced along a pattern on the surface to produce the patterned graphene. USE - The method is useful for producing a patterned graphene. ADVANTAGE - The method: is simple and rapid to produce graphene and to achieve conversion and in situ immobilization of carbon dioxide to form the graphene; is used for large-scale, industrial production of designable, patterned graphene; and avoids the problems associated with separate forming of graphene followed by patterns on the graphene. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for an apparatus (100) for producing a patterned graphene, comprising the ultra-short pulse laser configured to produce a laser beam and a housing (150) configured to accommodate a metal substrate and carbon dioxide, where the housing comprises an optical port configured to allow irradiation of focal point on a surface of the metal substrate by the laser beam. DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of the apparatus for producing a patterned graphene. Apparatus (100) Ultra-short pulse laser (110) Carbon dioxide (130) Metal substrate (140) Housing (150)