文献类型：期刊文献

中文题名：用常压化学气相沉积法制备SiO_2/S复合涂层的研究

英文题名：Preparation of SiO_2/S Composite Costing by AJPCVD and Characterization of the Coating

作者：周建新[1];徐宏[1];刘京雷[1];戚学贵[1]

机构：[1]华东理工大学化工机械研究所,上海200237

年份：2007

卷号：40

期号：2

起止页码：11

中文期刊名：材料保护

外文期刊名：Materials Protection

收录：CSTPCD;;北大核心:【北大核心2004】；CSCD:【CSCD2011_2012】；

语种：中文

中文关键词：常压化学气相沉积(APCVD);SiO2/S复合涂层;HP40合金

外文关键词：atmospheric pressure chemical vapor deposition ( APCVD); silicon dioxide/sulfur composite coating; HP40 alloy

摘要：以二甲基二硫(DMDS)和正硅酸乙酯(TEOS)为反应物,采用常压化学气相沉积法在HP40合金基体上成功制备了SiO2/S复合涂层。采用扫描电子显微镜(SEM)及其附带能谱仪(EDAX)、原子力显微镜(AFM)、X射线衍射(XRD)、Raman光谱等技术对涂层的形貌、元素成分、结构进行了表征,并对反应机理做了初步探讨。结果表明,SiO2/S复合涂层为无定形结构,主要由Si-O四面体的变形结构组成,S以S4及+4价状态与Si-O四面体的变形结构结合,涂层完整、致密。
SiO_2/S composite coating was prepared on HP40 alloy substrate via atmospheric pressure chemical vapor deposition ( APCVD ) , using dimethyl - disulfide (DMDS) and tetraethyl orthoslicate (TEOS) as the reagents. The morphology, microstmcture, composition, and structure of the composite coating were characterized by means of scanning e-lectron microscopy, energy dispersive X-ray analysis, atomic force microscopy, X-ray diffraction, and Raman spectrometry, and the reaction mechanism was discussed as well. The results showed that the resulting coating had amorphous structure and was mainly composed of deformed tetrahedral Si - O species. The S4 and S4+ species were chemically combined with the deformed tetrahedral Si - O species, and the composite coating was compact and had good coverage on the substrate surface.