文献类型：期刊文献

英文题名：Study of the adsorption reactions of thiophene on Cu(I)/HY-Al 2O3 by fourier transform infrared and temperature- programmed desorption: Adsorption, desorption, and sorbent regeneration mechanisms

作者：Tang, Xiao-Lin[1]; Shi, Li[1]

机构：[1] State Key Laboratory of Chemical Engineering, East China University of Science and Technology, Shanghai 200237, China

年份：2011

卷号：27

期号：19

起止页码：11999

外文期刊名：Langmuir

收录：EI(收录号：20114014395114)

语种：英文

外文关键词：Aluminum oxide - Copper compounds - Adsorption - Thiophene - Fourier transform infrared spectroscopy - Sulfur - Alumina

摘要：This work mainly involved the investigation of the adsorption of thiophene on Cu(I)-supported HY-Al2O3. It demonstrated a high sulfur capacity of 10 mg sulfur/g sorbent when the HY/Al2O3 mass ratio was 3, loaded with 12% copper, calcined at 550 °C, and tested at ambient temperature. In situ Fourier transform infrared (FTIR) and temperature-programmed desorption (TPD) results indicated that the adsorption mechanisms on Cu(I)/HY-Al2O3 primarily were π-complexation and sulfur-adsorbent (S-M; σ) bonds. Pyridine-FTIR showed the total weak Lewis acid contribution to the Cu(I)/HY-Al 2O3 adsorption desulfurization performance. ? 2011 American Chemical Society.