文献类型：期刊文献

中文题名：氧化铈抛光液在醇-水体系中的分散悬浮性及其抛光性能研究

英文题名：Study on the Dispersion Stability and Polishing Performance of CeO_(2)Polishing Solution in Alcohol?water System

作者：余欢[1];彭阳峰[1];高玮[1,2];赵月昌[2];杨筱琼[2]

机构：[1]华东理工大学化工学院,上海200237;[2]上海华明高纳稀土新材料有限公司,上海201611

年份：2023

卷号：44

期号：5

起止页码：13

中文期刊名：稀土

外文期刊名：Chinese Rare Earths

收录：CSTPCD;;Scopus;北大核心:【北大核心2020】；CSCD:【CSCD_E2023_2024】；

语种：中文

中文关键词：CeO_(2)抛光液;分散介质;分散剂;分散悬浮性

外文关键词：CeO_(2)polishing solution;dispersion medium;dispersant;dispersibility

摘要：研究了甲醇、乙醇、异丙醇与水的混合分散介质、分散剂PVP(聚乙烯吡咯烷酮)用量、CATB(十六烷基三甲基溴化铵)用量以及pH值对CeO_(2)抛光液分散悬浮性的影响,并进行了抛光性能验证。结果表明:60%(质量分数)甲醇-水作为分散介质,2%PVP和0.25%CATB(质量分数)为分散剂时,CeO_(2)抛光液的分散悬浮性效果最佳,沉降速率分别为3.83 mg/(cm^(3)·h)、3.16 mg/(cm^(3)·h)和3.16 mg/(cm^(3)·h),当两种分散剂复配使用能进一步增加抛光液的分散悬浮性,沉降速率为2.00 mg/(cm^(3)·h);pH值对CeO_(2)抛光液的分散悬浮性有较大影响,在抛光液不使用分散剂情况下,抛光液的分散悬浮稳定pH范围为5~9,沉降速率保持在3.80 mg/(cm^(3)·h)左右,在抛光液中复配使用分散剂PVP和CATB后,抛光液的分散悬浮稳定pH范围为5~8,沉降速率保持在2.00 mg/(cm^(3)·h)左右;调节pH为7,选取上述最佳效果的CeO_(2)抛光液抛光K9玻璃,玻璃表面粗糙度2.22 nm,材料去除速率3.83 mg/min,对比初始抛光液在材料去除速率上有进一步提高。
In this paper,in order to study the influence of dispersion medium,dispersant,pH on the dispersion suspen?sion of CeO_(2)polishing solution,CeO_(2)with an average particle size of 1.0μm~1.4μm was used as abrasive to investigate the effects of mixed dispersion medium from water and methanol,ethanol or isopropyl,the amount of dispersant polyvinyl pyrroli?done(short:PVP)or cetyltrimethyl ammonium bromide(short:CTAB),the pH value on the dispersion suspension of CeO_(2)polishing solution.The results show that:When methanol?water was selected as the dispersion medium,while the mass fraction of methanol was 60%,the dispersion suspension of CeO_(2)polishing solution was the best and the sedimentation rate was 0.38 g/(cm^(3)·h).When the mass fractions of PVP and CATB were 2%and 0.25%,respectively,the dispersion suspension of CeO_(2)polishing solution was the best and the sedimentation rate was 0.32 g/(cm^(3)·h).When the two dispersants were used in combination,the dispersion suspension of the polishing solution can be further increased and the sedimentation rate is 0.20 g/(cm^(3)·h).The pH value shows a great influence on the dispersion suspension of CeO_(2)polishing solution.Without any disper?sant in the polishing solution,the dispersion suspension of CeO_(2)polishing solution shows relatively stable in the pH range from 5 to 9,and the sedimentation rate is maintained at about 0.38 g/(cm^(3)·h).Combining with PVP and CATB in the polishing solution,its dispersion suspension was stable and the sedimentation rate remained about 0.20 g/(cm^(3)·h)when the pH ranged from 5 to 8.With 60%mass fraction of methanol?water as the dispersion medium,by adjusting the pH to 7,adding 2%PVP and 0.25%CATB,CeO_(2)polishing solution is prepared to polish K9 glass,the surface roughness is 2.22 nm,and the material removal rate is 3.83 mg/min.Compared with the initial polishing solution,the material removal rate is further im?proved.