详细信息

表面粗糙度对WS_(2)/Pt肖特基结光响应性能的影响    

Influence of Surface Roughness on the Photoresponse of WS_(2)/Pt Schottky Junction

文献类型:期刊文献

中文题名:表面粗糙度对WS_(2)/Pt肖特基结光响应性能的影响

英文题名:Influence of Surface Roughness on the Photoresponse of WS_(2)/Pt Schottky Junction

作者:殷泽宇[1];牟海川[1];王瑞斌[2];刘杰[1]

机构:[1]华东理工大学物理学院,上海200237;[2]上海交通大学分析测试中心,上海200240

年份:2025

卷号:51

期号:3

起止页码:428

中文期刊名:华东理工大学学报(自然科学版)

外文期刊名:Journal of East China University of Science and Technology

收录:;北大核心:【北大核心2023】;

语种:中文

中文关键词:WS_(2);Pt纳米粒子;热电子;紫外臭氧;光响应

外文关键词:WS_(2);Pt nanoparticle;hot electron;UV ozone;photoresponse

摘要:对通过化学气相沉积法生长、Pt纳米颗粒(Pt Nanoparticles,Pt NPs)修饰的多层WS_(2)的表面粗糙度进行了0~4 min不同时长的紫外臭氧处理。当处理时长为2 min时,WS_(2)的表面粗糙度(Sa)达到最大值,约为14 nm,这种现象主要归因于紫外臭氧对WS_(2)表面的氧化形成了非晶态的WO_(x)。随着处理时长延长,多层WS_(2)下层的新鲜WS_(2)暴露,氧化效应得到缓解。实验表明,经2 min紫外臭氧处理后的WS_(2)/Pt肖特基结在400~900 nm范围内展现出优异的光响应性能,特别是在近红外波段750nm处,其响应度高达18A/W,相比未处理的WS_(2)/Pt肖特基结的响应度提高了约60%,这主要归因于紫外臭氧处理使得WS_(2)/Pt肖特基结中WS_(2)表面粗糙化,粗糙度的增加增强了光激发而产生的电子-空穴对的分离,同时还增加了从Pt到WS_(2)的热电子注入。
The surface roughness of multilayer WS_(2)grown by chemical vapor deposition and modified with platinum nanoparticles(Pt NPs)was tuned by ultraviolet ozone treatment with the durations ranging from 0 to 4 min.The surface roughness(Sa)reached a maximum value of approximately 14 nm when the treatment time was 2 min,primarily attributed to the formation of amorphous WO_(x)due to the oxidation of the WS_(2)surface by ultraviolet ozone.As the treatment duration was extended,the underlying fresh layers of multilayer WS_(2)were exposed,mitigating the aforementioned oxidation effect.Characterization results demonstrated that the WS_(2)/Pt Schottky junction treated with ultraviolet ozone for 2 min exhibited superior photoresponse performance in the wavelength range of 400—900 nm,particularly at 750 nm in the near-infrared region,with a responsivity as high as 18 A/W,representing a nearly 60%improvement compared to the untreated WS_(2)/Pt Schottky junction.This enhanced performance can be primarily attributed to the increased surface roughness of the WS_(2)in the WS_(2)/Pt Schottky junction induced by ultraviolet ozone treatment.The increased roughness not only facilitated the separation of photo-generated electron-hole pairs but also enhanced the hot electron injection from Pt to WS_(2).

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