文献类型：期刊文献

英文题名：Electron-donating effect of metal-organic nanoclusters on sensitivity for nanoscale patterning

作者：Wu, Yue[1,2];Zhang, Xiaoya[1,2];Wang, Tao[1,2];Yu, Miaojie[2,3];Zhao, Jun[4];Long, Jiali[4];Wu, Yanqing[4];Zhu, Wei-Hong[2,3];Xu, Yisheng[1,2]

机构：[1]East China Univ Sci & Technol, Sch Chem Engn, State Key Lab Green Chem Engn & Ind Catalysis, State Key Lab Chem Engn, Shanghai 200237, Peoples R China;[2]East China Univ Sci & Technol, Ctr Photosensit Chem Engn, Shanghai 200237, Peoples R China;[3]East China Univ Sci & Technol, Feringa Nobel Prize Scientist Joint Res Ctr, Key Lab Adv Mat & Joint Int Res Lab Precis Chem &, Inst Fine Chem,Sch Chem Mol Engn, Shanghai 200237, Peoples R China;[4]Chinese Acad Sci, Shanghai Adv Res Inst, Shanghai 201210, Peoples R China

年份：2026

外文期刊名：SCIENCE CHINA-CHEMISTRY

收录：;EI(收录号：20262020708730);WOS:【SCI-EXPANDED(收录号:WOS:001765186300001)】；

基金：This work was supported by the National Natural Science Foundation of China (22378126, 22225805) and the Science and Technology Innovation Plan of Shanghai Science and Technology Commission (22501100500, 24JD1402900). The authors thank Huasuan Technology for all DFT calculations.

语种：英文

外文关键词：photoresist; sensitivity; electron-donating; metal-organic nanocluster

摘要：Nanolithography involves transforming optical signals into nanostructures on a substrate through a photoresist layer. Metal-organic cluster (MOC) photoresists, which combine metal atoms with organic ligands, have emerged as innovative materials. Despite extensive investigations into functional ligands and metal complexes, the sensitivity of metal-organic nanocluster photoresists remains influenced by the largely unexplored effects of non-metallic groups in organic ligands. Here, a series of aromatic Zr-based nanoscale metal-organic cluster photoresists (Zr-XBA) with non-metallic groups (methyl, fluorine, iodine) were synthesized to investigate their impact on sensitivity for nanoscale patterning. Zr-mMeBA modified with electron-donating group methyl showed higher sensitivity, which contributed to the development of high-performance photoresists. The results obtained through DFT simulations were consistent with the experimental results, demonstrating that Zr-mMeBA with a large HOMO-LUMO gap and weak electrophilic characteristics exhibited the best stability and the highest sensitivity. This research advances the understanding of MOC photoresists' patterning mechanisms and lays the groundwork for designing new high-performance photoresists.